Avis Senka Perfect Whip Mask Moisture Shiseido
Description
Water, PEG-60 glyceryl isostearate, DPG, maltitol, coconut fatty acid arginine, glycerin, polysorbate 20, polyquaternium-6, sodium hyaluronate, sericin, sodium acetyl hyaluronate, water soluble collagen, hydrolyzed silk, diglycerin, EDTA -2Na, hydroxylated K, tocopherol, ethanol, citric acid, sorbic acid K, phenoxyethanol